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TSMC will use immersion lithography tools for 10nm production, Sun said. The company has not yet announced what lithography tools it will use for more advanced nodes.
“We are working with ASML with the objective at some future point if extreme ultraviolet (EUV) becomes manufacturing ready, we can insert EUV partially to 10nm,” she said. “Partial insertion means only in a few critical layers.”
The use of EUV for process technology beyond 10nm still depends on whether it will be ready for manufacturing, Sun said. “It is still a work in progress,” she added.
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